Authors: da Silva, Antônio J. R.
Orellana, W.
Title: O2 Diffusion in SiO2: Triplet versus Singlet
Language (ISO): en
URI: http://hdl.handle.net/2003/1272
http://dx.doi.org/10.17877/DE290R-11215
Issue Date: 2001
Publisher: The American Physical Society
Appears in Collections:Issue 15

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