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dc.contributor.authorArtacho, E.de
dc.contributor.authorBlase, X.de
dc.contributor.authorConnétable, D.de
dc.contributor.authorTimoshevskii, V.de
dc.date.accessioned2004-12-03T15:16:10Z-
dc.date.available2004-12-03T15:16:10Z-
dc.date.created2001de
dc.date.issued2001de
dc.identifier.urihttp://hdl.handle.net/2003/1614-
dc.identifier.urihttp://dx.doi.org/10.17877/DE290R-11389-
dc.format.extent199272 bytes-
dc.format.mimetypeapplication/pdf-
dc.language.isoende
dc.publisherThe American Physical Societyde
dc.relation.ispartofseriesPhysical Review Lettersde
dc.subject.ddc530de
dc.titleTailoring Band Gap and Hardness by Intercalation: An ab initio Study of I8@Si-46 and Related Doped Clathratesen
dc.typeTextde
dc.identifier.doi10.1103/PhysRevLett.87.206405de
dc.type.publicationtypearticlede
dcterms.accessRightsrestricted-
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