Is Ion Sputtering Always a "Negative Homoepitaxial Deposition"?

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DC Field	Value	Language
dc.contributor.author	Boragno, C.	de
dc.contributor.author	Buatier de Mongeot, F.	de
dc.contributor.author	Costantini, G.	de
dc.contributor.author	Valbusa, U.	de
dc.date.accessioned	2004-12-10T11:53:18Z	-
dc.date.available	2004-12-10T11:53:18Z	-
dc.date.created	2001	de
dc.date.issued	2001	de
dc.identifier.uri	http://hdl.handle.net/2003/18230	-
dc.identifier.uri	http://dx.doi.org/10.17877/DE290R-12202	-
dc.format.extent	295704 bytes	-
dc.format.mimetype	application/pdf	-
dc.language.iso	en	de
dc.publisher	The American Physical Society	de
dc.relation.ispartofseries	Physical Review Letters	de
dc.subject.ddc	530	de
dc.title	Is Ion Sputtering Always a "Negative Homoepitaxial Deposition"?	en
dc.type	Text	de
dc.identifier.doi	10.1103/PhysRevLett.86.838	de
dc.type.publicationtype	article	de
dcterms.accessRights	restricted	-
Appears in Collections:	Issue 05

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