Authors: | Agarwal, Girish S. Bentley, Sean J. Boyd, Robert W. Nagasako, Elna M. |
Title: | Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" |
Language (ISO): | en |
URI: | http://hdl.handle.net/2003/18379 http://dx.doi.org/10.17877/DE290R-12539 |
Issue Date: | 2001 |
Provenance: | The American Physical Society |
Appears in Collections: | Issue 07 |
Files in This Item:
File | Description | Size | Format | |
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1389_1.pdf Restricted Access | 41.44 kB | Adobe PDF | View/Open |
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