Authors: Flüchter, Christian Rolf
Title: Structural analysis of HfO 2 and HfSi 2 ultra-thin films on Si(100)
Other Titles: a photoelectron diffraction study
Language (ISO): en
Subject Headings: Silizium
Hafnium
Photoelektronenspektroskopie
AFM
high-k
Photoelektronenbeugung
URI: http://hdl.handle.net/2003/25779
http://dx.doi.org/10.17877/DE290R-958
Issue Date: 2008-08-25T13:46:15Z
Appears in Collections:Experimentelle Physik I

Files in This Item:
File Description SizeFormat 
Dissertation.pdfDNB16.8 MBAdobe PDFView/Open


This item is protected by original copyright



All resources in the repository are protected by copyright.