Autor(en): | Fan, Zhisong Yu, Haiping Deng, Jianghua Li, Chunfeng |
Titel: | Molecular Dynamics Modeling of Atomic Diffusion Across Fe-Al Magnetic-pulse-welding Interface |
Sprache (ISO): | en |
Zusammenfassung: | In the present study, a molecular dynamic model has been developed for simulating of atomic diffusion behaviour in the Al-Fe system during the magnetic pulse welding process. Our simulations predict the structural evolution of the interfacial region. And the thickness of diffusion layer was studied. The atomic diffusion features at the bonding interface were investigated in detail. Furthermore, the concentration distribution of the elements across the diffusion layer was also presented in this paper. To verify the simulation results, relevant verification experiments were also carried out. The simulation results show a good correspondence with the experiments. |
Schlagwörter: | magnetic pulse welding atomic diffusion molecular dynamics interface |
URI: | http://hdl.handle.net/2003/37030 http://dx.doi.org/10.17877/DE290R-19027 |
Erscheinungsdatum: | 2018-05-14 |
Ist andere Form von: | http://hdl.handle.net/2003/36978 http://hdl.handle.net/2003/37029 |
Ist Teil von: | 8th International Conference on High Speed Forming |
Enthalten in den Sammlungen: | ICHSF 2018 |
Dateien zu dieser Ressource:
Datei | Beschreibung | Größe | Format | |
---|---|---|---|---|
2. Z.S. Fan - Molecular Dynamics Modeling of Atomic Diffusion across Fe-Al Magnetic-Pulse-Welding Interface.mp4 | DNB | 101.27 MB | mp4 | Öffnen/Anzeigen |
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