da Silva, Antônio J. R.Orellana, W.2004-12-032004-12-0320012001http://hdl.handle.net/2003/127210.17877/DE290R-11215enThe American Physical SocietyPhysical Review Letters530O2 Diffusion in SiO2: Triplet versus Singlet10.1103/PhysRevLett.87.155901article (journal)