Flüchter, Christian Rolf2008-08-252008-08-252008-08-25http://hdl.handle.net/2003/2577910.17877/DE290R-958enSiliziumHafniumPhotoelektronenspektroskopieAFMhigh-kPhotoelektronenbeugung530Structural analysis of HfO 2 and HfSi 2 ultra-thin films on Si(100)a photoelectron diffraction studydoctoral thesisurn:nbn:de:hbz:290-2003/25779-3