Anomalous Scaling of the Surface Width during Cu Electrodeposition

Huo, S.Schwarzacher, W.2004-12-102004-12-1020012001http://hdl.handle.net/2003/1807610.17877/DE290R-12438enThe American Physical SocietyPhysical Review Letters530Anomalous Scaling of the Surface Width during Cu Electrodeposition10.1103/PhysRevLett.86.256article (journal)