Dürr, M.Höfer, U.Pehlke, E.Raschke, M. B.2004-12-102004-12-1020012001http://hdl.handle.net/2003/1801810.17877/DE290R-11854enThe American Physical SocietyPhysical Review Letters530Structure Sensitive Reaction Channels of Molecular Hydrogen on Silicon Surfaces10.1103/PhysRevLett.86.123article (journal)