Anomalous Scaling of the Surface Width during Cu Electrodeposition

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DC Field	Value	Language
dc.contributor.author	Huo, S.	de
dc.contributor.author	Schwarzacher, W.	de
dc.date.accessioned	2004-12-10T11:16:50Z	-
dc.date.available	2004-12-10T11:16:50Z	-
dc.date.created	2001	de
dc.date.issued	2001	de
dc.identifier.uri	http://hdl.handle.net/2003/18076	-
dc.identifier.uri	http://dx.doi.org/10.17877/DE290R-12438	-
dc.format.extent	368815 bytes	-
dc.format.mimetype	application/pdf	-
dc.language.iso	en	de
dc.publisher	The American Physical Society	de
dc.relation.ispartofseries	Physical Review Letters	de
dc.subject.ddc	530	de
dc.title	Anomalous Scaling of the Surface Width during Cu Electrodeposition	en
dc.type	Text	de
dc.identifier.doi	10.1103/PhysRevLett.86.256	de
dc.type.publicationtype	article	de
dcterms.accessRights	restricted	-
Appears in Collections:	Issue 02

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