Authors: | Takahashi, Masahide Uchino, Takashi Yoko, Toshinobu |
Title: | Mechanism of Interconversion among Radiation-Induced Defects in Amorphous Silicon Dioxide |
Language (ISO): | en |
URI: | http://hdl.handle.net/2003/18485 http://dx.doi.org/10.17877/DE290R-16127 |
Issue Date: | 2001 |
Provenance: | The American Physical Society |
Appears in Collections: | Issue 09 |
Files in This Item:
File | Description | Size | Format | |
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1777_1.pdf Restricted Access | 107.69 kB | Adobe PDF | View/Open |
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