Oxidation behavior of vanadium in annealed AlCrVY(O)N thin films characterized by X‐ray absorption spectroscopy

dc.contributor.authorSchneider, Eric
dc.contributor.authorOntrup, Finn
dc.contributor.authorScholz, Gordon
dc.contributor.authorSavelkouls, Jaqueline
dc.contributor.authorLopes Dias, Nelson Filipe
dc.contributor.authorSternemann, Christian
dc.contributor.authorLützenkirchen‐Hecht, Dirk
dc.contributor.authorTillmann, Wolfgang
dc.contributor.authorPaulus, Michael
dc.date.accessioned2026-08-04T09:54:47Z
dc.date.issued2024-12-22
dc.description.abstractGreat efforts are being made to optimize tool coatings for use at elevated process temperatures. The reason for this is to enable machining with minimized lubrication quantities. During operation, temperatures between 300 and 1000 °C can occur depending on the material and tool design. Thus to enable the machining of high-strength materials, the tool coatings must be optimized with regard to their temperature resistance, which is also significantly affected by their oxidation properties. AlCrVY(O)N thin films are potential candidates for such coating applications as the addition of V to AlCrN favors the formation of so-called Magnéli phases at high temperatures, that is, V oxides with varying stoichiometry, to reduce friction. X-ray absorption spectroscopy is applied to characterize the oxidation behavior of V in the thin films prepared in a combined dcMS/HiPIMS process for as-deposited AlCrVY(O)N thin films and after thermal treatment in the ambient atmosphere. The V average oxidation state is determined by analyzing the pre-edge feature at the V K-edge. Systematic changes in preoxidation, a high oxidation resistance below 800 °C, and promoted V oxidation for higher preoxidized coatings above 800 °C are found.en
dc.identifier.doi10.1002/pssa.202400682
dc.identifier.issn1862-6300
dc.identifier.issn1862-6319
dc.identifier.urihttp://hdl.handle.net/2003/45077
dc.language.isoen
dc.publisherWiley
dc.relation.ispartofphysica status solidi (a)
dc.relation.ispartofseriesPhysica status solidi; 222(14)
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.subjectAlCrVYONen
dc.subjectMagnetron sputteringen
dc.subjectThin filmsen
dc.subjectVanadium oxidesen
dc.subjectX-ray absorption spectroscopyen
dc.subject.ddc530
dc.titleOxidation behavior of vanadium in annealed AlCrVY(O)N thin films characterized by X‐ray absorption spectroscopyen
dc.typeText
dc.type.publicationtypeResearchArticle
dcterms.accessRightsopen access
eldorado.dnb.deposittrue
eldorado.doi.registerfalse
eldorado.secondarypublicationtrue
eldorado.secondarypublication.primarycitationSchneider, E., Rümenapf, F., Scholz, G., Savelkouls, J., Lopes Dias, N. F., Sternemann, C., Lützenkirchen‐Hecht, D., Tillmann, W., & Paulus, M. (2025). Oxidation behavior of vanadium in annealed AlCrVY(O)N thin films characterized by X‐ray absorption spectroscopy. Physica Status Solidi A, 222(14), Article 2400682. https://doi.org/10.1002/pssa.202400682
eldorado.secondarypublication.primaryidentifierhttps://doi.org/10.1002/pssa.202400682
oaire.citation.issue14
oaire.citation.volume222

Dateien

Originalbündel

Gerade angezeigt 1 - 1 von 1
Lade...
Vorschaubild
Name:
Physica Status Solidi a - 2024 - Schneider - Oxidation Behavior of Vanadium in Annealed AlCrVY O N Thin Films.pdf
Größe:
843.15 KB
Format:
Adobe Portable Document Format
Beschreibung:
DNB

Lizenzbündel

Gerade angezeigt 1 - 1 von 1
Lade...
Vorschaubild
Name:
license.txt
Größe:
4.82 KB
Format:
Item-specific license agreed upon to submission
Beschreibung: