an ion beam complement to electron beam writers

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dc.contributor.advisorHövel, Heinz
dc.contributor.authorBruchhaus, Lars
dc.contributor.refereeWeis, Thomas
dc.date.accepted2012-05-10
dc.date.accessioned2012-07-16T09:33:28Z
dc.date.available2012-07-16T09:33:28Z
dc.date.issued2012-07-16
dc.description.abstractWith the technology expertise from complementary fields, we have managed to develop a new liquid metal ion source (LMIS) focused ion beam (FIB) instrument dedicated to nano patterning. It possesses an acceleration voltage regime up to 40 kV. The instrument is a commensurate alternative nano patterning tool which has enabled us to explore a large amount of successful application fields. In our experiments we have exploited also additional ion-matter interactions to the two current main stream ones (sputtering and gas assisted processing). For example employing 40 keV Ga ions, we have analysed two applications in more detail: We exposed a 6 nm thin hydrogen silsesquioxane (HSQ) resist and reached a line-width thinner than 10 nm as well as a minimum period of 30 nm. In addition we exploited the instrument patterning strategies flexibility to analyse a long known minimum line-width limiting effect in LMIS resist exposure. Thin films of Au55 clusters were exposed as a potential candidate for process complexity reduction in nano fabrication of conducting features. Further promising results are summarised proving the instrument stability and applicability.en
dc.identifier.urihttp://hdl.handle.net/2003/29512
dc.identifier.urihttp://dx.doi.org/10.17877/DE290R-14294
dc.language.isoende
dc.subjectAu55de
dc.subjectcharged particle opticsen
dc.subjectFIBde
dc.subjectfocused ion beamen
dc.subjectgold clusteren
dc.subjectHSQen
dc.subjectIBLen
dc.subjection beam lithographyen
dc.subjection matter interactionsen
dc.subjectliquid metal ion sourceen
dc.subjectLMISde
dc.subjectnano patterningen
dc.subjectnanostructuresen
dc.subjectnanostructuringen
dc.subject.ddc530
dc.subject.rswkIonenstrahllithographiede
dc.subject.rswkNanolithographiede
dc.titlean ion beam complement to electron beam writersen
dc.title.alternativea part of the development, characterisation and utilisationen
dc.typeTextde
dc.type.publicationtypedoctoralThesisde
dcterms.accessRightsopen access

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Experimentelle Physik I