Authors: Fan, Zhisong
Yu, Haiping
Deng, Jianghua
Li, Chunfeng
Title: Molecular Dynamics Modeling of Atomic Diffusion Across Fe-Al Magnetic-pulse-welding Interface
Language (ISO): en
Abstract: In the present study, a molecular dynamic model has been developed for simulating of atomic diffusion behaviour in the Al-Fe system during the magnetic pulse welding process. Our simulations predict the structural evolution of the interfacial region. And the thickness of diffusion layer was studied. The atomic diffusion features at the bonding interface were investigated in detail. Furthermore, the concentration distribution of the elements across the diffusion layer was also presented in this paper. To verify the simulation results, relevant verification experiments were also carried out. The simulation results show a good correspondence with the experiments.
Subject Headings: magnetic pulse welding
atomic diffusion
molecular dynamics
interface
URI: http://hdl.handle.net/2003/36978
http://dx.doi.org/10.17877/DE290R-18977
Issue Date: 2018-05-15
Is variant form of: http://hdl.handle.net/2003/37029
http://hdl.handle.net/2003/37030
Is part of: 8th International Conference on High Speed Forming
Appears in Collections:ICHSF 2018

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