Autor(en): Fan, Zhisong
Yu, Haiping
Deng, Jianghua
Li, Chunfeng
Titel: Molecular Dynamics Modeling of Atomic Diffusion Across Fe-Al Magnetic-pulse-welding Interface
Sprache (ISO): en
Zusammenfassung: In the present study, a molecular dynamic model has been developed for simulating of atomic diffusion behaviour in the Al-Fe system during the magnetic pulse welding process. Our simulations predict the structural evolution of the interfacial region. And the thickness of diffusion layer was studied. The atomic diffusion features at the bonding interface were investigated in detail. Furthermore, the concentration distribution of the elements across the diffusion layer was also presented in this paper. To verify the simulation results, relevant verification experiments were also carried out. The simulation results show a good correspondence with the experiments.
Schlagwörter: magnetic pulse welding
atomic diffusion
molecular dynamics
interface
URI: http://hdl.handle.net/2003/36978
http://dx.doi.org/10.17877/DE290R-18977
Erscheinungsdatum: 2018-05-15
Ist andere Form von: http://hdl.handle.net/2003/37029
http://hdl.handle.net/2003/37030
Ist Teil von: 8th International Conference on High Speed Forming
Enthalten in den Sammlungen:ICHSF 2018

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