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dc.contributor.authorTillmann, Wolfgang-
dc.contributor.authorKokalj, David-
dc.contributor.authorStangier, Dominic-
dc.contributor.authorSchöppner, Volker-
dc.contributor.authorMalatyali, Hatice-
dc.date.accessioned2019-08-08T06:05:43Z-
dc.date.available2019-08-08T06:05:43Z-
dc.date.issued2019-08-03-
dc.identifier.urihttp://hdl.handle.net/2003/38169-
dc.identifier.urihttp://dx.doi.org/10.17877/DE290R-20148-
dc.description.abstractThin film thermocouples are widely used for local temperature determinations of surfaces. However, depending on the environment in which they are used, thin film thermocouples need to be covered by a wear or oxidation resistant top layer. With regard to the utilization in wide-slit nozzles for plastic extrusion, Ni/Ni-20Cr thin film thermocouples were manufactured using direct-current (DC) magnetron sputtering combined with Aluminiumnitride (AlN) and Boron-Carbonitride (BCN) thin films. On the one hand, the deposition parameters of the nitride layers were varied to affect the chemical composition and morphology of the AlN and BCN thin films. On the other hand, the position of the nitride layers (below the thermocouple, above the thermocouple, around the thermocouple) was changed. Both factors were investigated concerning the influence on the Seebeck coefficient and the reaction behaviour of the thermocouples. Therefore, the impact of the nitride thin films on the morphology, physical structure, crystallite size, electrical resistance and hardness of the Ni and Ni-20Cr thin films is analysed. The investigations reveal that the Seebeck coefficient is not affected by the different architectures of the thermocouples. Nevertheless, the reaction time of the thermocouples can be significantly improved by adding a thermal conductive top coat over the thin films, whereas the top coat should have a coarse structure and low nitrogen content.en
dc.language.isoende
dc.relation.ispartofseriesSensors;19(15)-
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/-
dc.subjectNickel-chromiumen
dc.subjectAluminium nitrideen
dc.subjectBoron carbon nitrideen
dc.subjectThermovoltageen
dc.subjectResistivityen
dc.subjectThin film thermocouplesen
dc.subjectReaction timeen
dc.subjectPhysical vapor depositionen
dc.subjectMultilayeren
dc.subject.ddc620-
dc.subject.ddc670-
dc.titleEffects of AlN and BCN thin film multilayer design on the reaction time of Ni/Ni-20Cr thin film thermocouples on thermally sprayed Al2O3en
dc.typeTextde
dc.type.publicationtypearticlede
dcterms.accessRightsopen access-
eldorado.secondarypublicationtruede
eldorado.secondarypublication.primaryidentifierdoi:10.3390/s19153414de
eldorado.secondarypublication.primarycitationTillmann, W.; Kokalj, D.; Stangier, D.; Schöppner, V.; Malatyali, H. Effects of AlN and BCN Thin Film Multilayer Design on the Reaction Time of Ni/Ni-20Cr Thin Film Thermocouples on Thermally Sprayed Al2O3. Sensors 2019, 19, 3414de
Appears in Collections:Lehrstuhl für Werkstofftechnologie

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