A New Deep X-Ray Lithography Beamline at DELTA

Abstract

The efforts in today’s technology to produce highly functional devices on ever decreasing dimensional scales demand new production techniques in the field of micro technology. The required micro components cannot be produced with mechanical tools. Instead, micro mechanical components with a height of up to several millimeter and a sub-micron lateral resolution are manufactured by lithography using x-rays. The required x-ray radiation needs to have a high penetration depth, a high intensity and a high parallelism. These demands are met by synchrotron radiation sources. Within the course of this thesis a dedicated deep x-ray lithography beamline is planned and constructed at the synchrotron radiation facility DELTA at the Technische Universität Dortmund. After beamline commissioning including beam characterization measurements, test wafers are exposed at the new beamline. The generated structures are investigated after chemical development concerning edge steepness, structure fidelity, and sidewall roughness.