A New Deep X-Ray Lithography Beamline at DELTA
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Date
2011-02-02
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Setup and Performance
Abstract
The efforts in today’s technology to produce highly functional devices on ever decreasing
dimensional scales demand new production techniques in the field of micro technology.
The required micro components cannot be produced with mechanical tools. Instead, micro
mechanical components with a height of up to several millimeter and a sub-micron lateral
resolution are manufactured by lithography using x-rays. The required x-ray radiation needs
to have a high penetration depth, a high intensity and a high parallelism. These demands are
met by synchrotron radiation sources.
Within the course of this thesis a dedicated deep x-ray lithography beamline is planned
and constructed at the synchrotron radiation facility DELTA at the Technische Universität
Dortmund. After beamline commissioning including beam characterization measurements,
test wafers are exposed at the new beamline. The generated structures are investigated after
chemical development concerning edge steepness, structure fidelity, and sidewall roughness.
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Keywords
Deep x-ray lithography, Micro technology, Beamline, DELTA, Synchrotron radiation, LIGA, Röntgentiefenlithographie, Mikrotechnik, Strahllinie, Synchrotronstrahlung