Structural analysis of HfO 2 and HfSi 2 ultra-thin films on Si(100)

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DC Field	Value	Language
dc.contributor.advisor	Westphal, Carsten	-
dc.contributor.author	Flüchter, Christian Rolf	-
dc.date.accessioned	2008-08-25T13:46:15Z	-
dc.date.available	2008-08-25T13:46:15Z	-
dc.date.issued	2008-08-25T13:46:15Z	-
dc.identifier.uri	http://hdl.handle.net/2003/25779	-
dc.identifier.uri	http://dx.doi.org/10.17877/DE290R-958	-
dc.language.iso	en	de
dc.subject	Silizium	de
dc.subject	Hafnium	de
dc.subject	Photoelektronenspektroskopie	de
dc.subject	AFM	de
dc.subject	high-k	de
dc.subject	Photoelektronenbeugung	de
dc.subject.ddc	530	-
dc.title	Structural analysis of HfO 2 and HfSi 2 ultra-thin films on Si(100)	en
dc.title.alternative	a photoelectron diffraction study	en
dc.type	Text	de
dc.contributor.referee	Spoon, B.	-
dc.date.accepted	2008-08-12	-
dc.type.publicationtype	doctoralThesis	de
dc.identifier.urn	urn:nbn:de:hbz:290-2003/25779-3	-
dcterms.accessRights	open access	-
Appears in Collections:	Experimentelle Physik I

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