Authors: Bruchhaus, Lars
Title: an ion beam complement to electron beam writers
Other Titles: a part of the development, characterisation and utilisation
Language (ISO): en
Abstract: With the technology expertise from complementary fields, we have managed to develop a new liquid metal ion source (LMIS) focused ion beam (FIB) instrument dedicated to nano patterning. It possesses an acceleration voltage regime up to 40 kV. The instrument is a commensurate alternative nano patterning tool which has enabled us to explore a large amount of successful application fields. In our experiments we have exploited also additional ion-matter interactions to the two current main stream ones (sputtering and gas assisted processing). For example employing 40 keV Ga ions, we have analysed two applications in more detail: We exposed a 6 nm thin hydrogen silsesquioxane (HSQ) resist and reached a line-width thinner than 10 nm as well as a minimum period of 30 nm. In addition we exploited the instrument patterning strategies flexibility to analyse a long known minimum line-width limiting effect in LMIS resist exposure. Thin films of Au55 clusters were exposed as a potential candidate for process complexity reduction in nano fabrication of conducting features. Further promising results are summarised proving the instrument stability and applicability.
Subject Headings: Au55
charged particle optics
FIB
focused ion beam
gold cluster
HSQ
IBL
ion beam lithography
ion matter interactions
liquid metal ion source
LMIS
nano patterning
nanostructures
nanostructuring
Subject Headings (RSWK): Ionenstrahllithographie
Nanolithographie
URI: http://hdl.handle.net/2003/29512
http://dx.doi.org/10.17877/DE290R-14294
Issue Date: 2012-07-16
Appears in Collections:Experimentelle Physik I

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