Authors: | Bruchhaus, Lars |
Title: | an ion beam complement to electron beam writers |
Other Titles: | a part of the development, characterisation and utilisation |
Language (ISO): | en |
Abstract: | With the technology expertise from complementary fields, we have managed to develop a new liquid metal ion source (LMIS) focused ion beam (FIB) instrument dedicated to nano patterning. It possesses an acceleration voltage regime up to 40 kV. The instrument is a commensurate alternative nano patterning tool which has enabled us to explore a large amount of successful application fields. In our experiments we have exploited also additional ion-matter interactions to the two current main stream ones (sputtering and gas assisted processing). For example employing 40 keV Ga ions, we have analysed two applications in more detail: We exposed a 6 nm thin hydrogen silsesquioxane (HSQ) resist and reached a line-width thinner than 10 nm as well as a minimum period of 30 nm. In addition we exploited the instrument patterning strategies flexibility to analyse a long known minimum line-width limiting effect in LMIS resist exposure. Thin films of Au55 clusters were exposed as a potential candidate for process complexity reduction in nano fabrication of conducting features. Further promising results are summarised proving the instrument stability and applicability. |
Subject Headings: | Au55 charged particle optics FIB focused ion beam gold cluster HSQ IBL ion beam lithography ion matter interactions liquid metal ion source LMIS nano patterning nanostructures nanostructuring |
Subject Headings (RSWK): | Ionenstrahllithographie Nanolithographie |
URI: | http://hdl.handle.net/2003/29512 http://dx.doi.org/10.17877/DE290R-14294 |
Issue Date: | 2012-07-16 |
Appears in Collections: | Experimentelle Physik I |
Files in This Item:
File | Description | Size | Format | |
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Dissertation.pdf | DNB | 3.79 MB | Adobe PDF | View/Open |
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